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Lindberg/Tempress Model 8500 Dual-Stack Diffusion/Oxidation Furnaces

Lindberg/Tempress Model 8500 Dual-Stack Diffusion/Oxidation Furnaces

Photo of Lindberg/Tempress Model 8500 Dual-Stack Diffusion/Oxidation Furnaces

This system has 8 tubes which are currently reserved for the following:

  • wet / dry oxidation
  • GaN anneal
  • SiC oxidation
  • polymer bake
  • Boron Diffusion
  • Phosphorous diffusion
  • A "No Restrictions" tube, which has forming gas (H2 mixture) supplied

All tubes operate at atmospheric pressure and are capable of temperatures to 1150C. They are all supplied with N2 and O2.

See temperature calibration information here.

Training video.