Jipelec Rapid Thermal Processor (RTP)
The Jipelec RTP tool is available to anneal, thermally oxidize, and alloy contacts for Silicon and Gallium Arsenide. It can be used on small pieces up to 150mm wafers. The cold wall chamber can be used under vacuum as well as atmospheric pressure using N2 or O2. The system is controlled using thermocouple feedback. The system can reach up to 700 °C at a rate between 1 and 30 °C/s.