Heidelberg uPG 101 Maskless Lithography

Heidelberg uPG 101 Maskless Lithography

Heidelberg is a maskless direct writing system which uses a 390nm laser to write on the substrate. The tool is configured with two different write modes such allowing high resolution writing (to 1 micron) or high speed writing (to 2.5 micron). The Heidelberg is also capable of interlayer alignment with overlay accuracy of 200nm. The tool can accommodate substrate size varying from small pieces to 5 inch mask plate.