Elionix 150 keV E-Beam Lithography System

Elionix ELS-G150 is the highest energy electron beam lithography tool in North America (150 keV). The high energy allows it to pattern narrow line widths (to 4nm) and reduce proximity effect. Small samples through 200mm wafers can be patterned. Users can be trained to use the tool or HMNTL staff can provide patterns for researchers.