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Cooke Dual-Gun Sputter System

Cooke Dual-Gun Sputter System

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The Cooke sputter system contains two 3” targets (1/4" thick) which are normally set up with ITO and Al. Cr, Ni-Cr, Si and Zn-O are also allowed. Please contact the super user if other materials are desired. Ac or DC plasmas can be obtained in either O2 or Ar gases (or both). The system is very quick and easy to use. The pumping system achieves low 10 –6 torr pressure in less than 20 minutes and has an automated control system. A 1000W substrate heater is available.