Veeco Nanotech Atomic Layer Deposition System

The Veeco NanoTech Atomic Layer Deposition tool is available for depositing Aluminum Oxide, Hafnium Oxide, Silicon Oxide and Zirconium Oxide films. The ALD system can deposit a monolayer per cycle allowing digital thickness control to the atomic level. This precision thin film coating method provides conformal, uniform films. No metals or polymers are allowed in this system. The deposition area can accommodate sample sizes up to a 100 mm wafer.