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CHA SEC-600 E-Beam Evaporator

CHA SEC-600 E-Beam Evaporator
 

The CHA has 2 independent resistive power supplies and an electron beam (e – beam) gun with 4 automatically selected source crucibles. Currently approved deposition materials are Ag, Au, Cr, Ge, Ni, Mo, Pd, Pt and Ti. Two 4 inch (100mm) round targets can be positioned (automatically) above any of the three sources. Alternatively, a 1 inch square sample holder with 1000W substrate heater can be installed above a resistive source. A computerized controller provides precise control of deposition thickness and rate, and allows one to save and reload recipes for single and multiple layer processes.

CHA Instructions
CHA Quick Reference
CHA Training video