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XACTIX XeF2 Etching System

XACTIX XeF2 Etching System

The XACTIX XeF2 etching system is an isotropic silicon etching system. XeF2 etching is a dry, room temperature process. The tool can provide nearly infinite selectivity of silicon to photoresists and hard masks. The tool is currently configured to etch small samples through 150mm wafers.