K. J. Lesker Dual-Gun Sputter System
The Lesker PVD 75 sputter system is for sputtering dielectric / optical materials only. It contains two 3” sputter guns which can operate in Ar, O2 and / or N2. The computerized control system precisely controls turbo pump speed and gas flow and provides for scripting and recipe use in addition to manual operation. A large rotating sample platen can hold sample sizes from small pieces up to 12 " (adequate uniformity for up to 6 " wafers). Quartz lamps provide sample heating to 300C (?).