facilities
Highlights
Rudolph FE-III Focus Ellipsometer
Description:
The FE-III has fully automatic operation and a scanning stage. Unique optical and detection systems measure ellipsometric parameters over an angle range of 40 to 70 degrees simultaneously, giving more flexibility for measuring multiple film stacks. The scanning stage allows wafer uniformity to be evaluated rapidly. The system automatically calculates film thickness, index of refraction, and the extinction coefficient. Automatic or manual wafer loading; can be used with small pieces or full wafers up to 8” diameter.