facilities
Highlights
PlasmaTherm SLR-770 Inductively Coupled Plasma Reactive Ion Etcher
Description:
A 6 inch diameter parallel plate reactive ion etch system, the Plasma Therm shuttlelock SSL-720 is configured with a load lock capable of handling 3 inch to 6 inch wafers. The microprocessor control allows the user to select from eight etch gases including chlorine based gases for silicon etching.
Characteristics:
Chlorine based gases: Cl2, BCl3, SiCl4, CHF3, HBr
Load locked sample introduction
Up to 6 inch wafer capability
Turbomolecular pumping
Microprocessor control
Features:
10 - 1000 mT processing pressure
Incident power or voltage control
Substrate temperature uniformity
Variable gas chemistry
High selectivity silicon etch