PlasmaTherm SLR-770 Inductively Coupled Plasma Reactive Ion Etcher
6 inch diameter parallel plate reactive ion etch system, the Plasma
Therm shuttlelock SSL-770 is configured with a load lock capable
of handling 4 inch wafers. The microprocessor control
allows the user to select from eight etch gases including chlorine
based gases for III - V and compound semiconductor etching.
Metal and photoresist are not allowed in the system.
Chlorine based gases: Cl2, BCl3, SiCl4, CHF3, HBr
Load locked sample introduction
Up to 4 inch wafer capability
10 - 1000 mT processing pressure
Incident power or voltage control
Substrate temperature uniformity
Variable gas chemistry