Micro and Nanotechnology Laboratory | U of I

Highlights

PlasmaLab Master / Slave Dual-Chamber Reactive Ion Etcher

Description:

The “master” chamber is a turbo pumped general purpose RIE utilizing the following gases:
Ar, BCl3, Cl2, O2, SiCl4, SF6, H2, CH4, N2

The “slave” chamber is also general purpose and uses:
R14 (CF4), CH4, Ar, O2, SF6, H2, N2

Master Chamber Instructions (pdf)

Slave Chamber Instructions (pdf)