Lindberg/Tempress Model 8500 Dual-Stack Diffusion/Oxidation Furnaces
This system has 8 tubes which are currently
reserved for the following:
- wet / dry oxidation
- GaN anneal
- SiC oxidation
- Boron Diffusion
- Phosphorous diffusion
- A "No Restrictions" tube, which has forming gas (H2 mixture) supplied
All tubes operate at atmospheric pressure and are capable of temperatures to 1150C. They are all supplied with N2 and O2.
See temperatuer calibration information here.