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Micro and Nanotechnology Laboratory
208 North Wright Street Urbana, Illinois 61801


Office hours 8:30a - 5:00p


Phone: 217-333-3097
Fax: 217-244-6375


Jipelec Rapid Thermal Processor (RTP)

Jipelec Rapid Thermal Processor (RTP)


The Jipelec JetFirst RTP feature a temperature measurement and control system to provide accurate and repeatable thermal behavior from low to high temperatures

The lamp array, upper flange and quartz window are mounted in a rotating top lid allowing full access to the chamber for easy loading and unloading of the wafers and piece-parts samples


  • RTA: Annealing for silicon and III-V wafers
  • RTO: Rapid Thermal Oxidation
  • Contact Alloying 
  • Up to 150 mm wafers
  • Cold wall chamber technology
  • Pyrometer and thermocouple temperature control
  • Atmospheric and vacuum process capability
  • One purge gas line
  • 2 process gases are connected:
    1. N2
    2. O2
  • PC control
  • Vacuum valve and vacuum gauge
  • Temperature range: ambient to 700°C
  • Ramp rate: 1°C/s to 30°C/s

Jipelec RTP Instructions (pdf)