Facilities
Highlights
FEI Model 611 Focused Ion Beam System
Description:
This tool uses a Ga liquid metal ion source to produce an intense beam of ions. It is capable of milling a varity of metals, semiconductor and dielectric material as well as depoistion of Pt and SiO. The system is equipped with a vacuum loadlock to enable rapid transfer of samples. It is also equipped with a computer controlled 5-axis motorized stage to allow different milling angle with respect to sample surface.
For more information contact Edmond Chow (echow@uiuc.edu)
Operation procedure (.pdf file)
Last Updated: Jan 2007
| Si trench |
| 4 micro SiN hole |
| Pt deposition |