Illinois Mark

Micro and Nanotechnology Laboratory | U of I

Main Navigation



Micro and Nanotechnology Laboratory
208 North Wright Street Urbana, Illinois 61801


Office hours 8:30a - 5:00p


Phone: 217-333-3097
Fax: 217-244-6375


Cooke Dual-Gun Sputter System

Cooke Dual-Gun Sputter System


The Cooke sputter system contains two 3” targets (1/4" thick) which are normally set up with ITO and Al. Cr, Ni-Cr, Si and Zn-O are also allowed. Please contact the super user if other materials are desired. Ac or DC plasmas can be obtained in either O2 or Ar gases (or both). The system is very quick and easy to use. The pumping system achieves low 10 –6 torr pressure in less than 20 minutes and has an automated control system. A 1000W substrate heater is available.