CHA SEC-600 E-Beam/Thermal Evaporator
CHA has 2 independent resistive power supplies
and an electron beam (e – beam) gun with 4 automatically
selected source crucibles. Currently approved deposition materials
are Ag, Al, Au, Cr, Ge, Ni, Mo, Pd, Pt, Ti, and W. Two 4 inch (100mm)
round targets can be positioned (automatically) above any of the
three sources. Alternatively, a 1 inch square sample holder with
1000W substrate heater can be installed above a resistive source.
A computerized controller provides precise control of deposition
thickness and rate, and allows one to save and reload recipes for
single and multiple layer processes.
CHA Quick Reference