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Micro and Nanotechnology Laboratory | U of I

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CONTACT US

 

Micro and Nanotechnology Laboratory
208 North Wright Street Urbana, Illinois 61801

 

Office hours 8:30a - 5:00p

 

Phone: 217-333-3097
Fax: 217-244-6375
email: mntl@illinois.edu

facilities

XACTIX XeF2 Etching System

Description:

The XACTIX XeF2 etching system is an isotropic silicon etching system. XeF2 etching is a dry, room temperature process. It is particularly well suited to MEMS applications. This system can provide nearly infinite selectivity of silicon to photoresist, SiO2, Si3N4, Al, and Cr. The system process chamber can accommodate individual die, pieces of wafer, and full wafers up to 6 in diameter. The recipe-driven control software will manage multiple users and log all process data.

Instruction Set