K. J. Lesker Dual-Gun Sputter System
The Lesker PVD 75 sputter system is for sputtering dielectric /
optical materials only. It contains two 3” sputter guns which can operate in Ar,
O2 and / or N2. The computerized control system precisely controls turbo pump
speed and gas flow and provides for scripting and recipe use in addition to
manual operation. A large rotating sample platen can hold sample sizes from
small pieces up to 12 " (adequate uniformity for up to 6 " wafers). Quartz lamps
provide sample heating to 300C (?).