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Micro and Nanotechnology Laboratory
208 North Wright Street Urbana, Illinois 61801


Office hours 8:30a - 5:00p


Phone: 217-333-3097
Fax: 217-244-6375


K. J. Lesker Dual-Gun Sputter System


The Lesker PVD 75 sputter system is for sputtering dielectric / optical materials only. It contains two 3 sputter guns which can operate in Ar, O2 and / or N2. The computerized control system precisely controls turbo pump speed and gas flow and provides for scripting and recipe use in addition to manual operation. A large rotating sample platen can hold sample sizes from small pieces up to 12 " (adequate uniformity for up to 6 " wafers). Quartz lamps provide sample heating to 300C (?).  

Operating Instructions

Lesker Manual