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Micro and Nanotechnology Laboratory | U of I

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Micro and Nanotechnology Laboratory
208 North Wright Street Urbana, Illinois 61801


Office hours 8:30a - 5:00p


Phone: 217-333-3097
Fax: 217-244-6375


Idonus HF Vapor System

System Description:

The Idonus HF Vapor Phase Etching System (Idonus HF VPE-100/150) is used to etch SiO2. It provides a variety of new processing options for MEMS fabrication. The system consists of a reaction chamber, a wafer holder, and a controller. The wafer holder accommodates small substrate pieces as well as wafers up to 6 in diameter. A heating element is integrated into the wafer holder. The etching rate can be controlled by adjusting the wafer temperature from 35C to 60C. The etching process can also be done at room temperature.