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Micro and Nanotechnology Laboratory | U of I

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Micro and Nanotechnology Laboratory
208 North Wright Street Urbana, Illinois 61801


Office hours 8:30a - 5:00p


Phone: 217-333-3097
Fax: 217-244-6375


GCA DSW-6100 G-Line Series Wafer Stepper


This tool uses a g-line (436 nm) lens column ( 0.30 N/A) to provide a 5:1 reduction with a variable field size up to 2 cm square. The number and placement of the dies is programmable. Minimum feature size is less than 0.9 um. Various diameter wafers can be accommodated, as well as smaller pieces. 5" reticles are used. There are some restrictions on what substrate thicknesses can be accommodated in this system.


Step and repeat exposure system with laser-controlled stage motion
Zeiss 5X reduction lens with 0.30 numerical aperture 
G-line (436 nm) exposure wavelength 
20 x 20 mm field size 
Resolution to 0.9 µm
Overlay accuracy to <0.25 µm 

For more information contact John Hughes