Micro and Nanotechnology Laboratory | U of I

The Cambridge NanoTech Atomic Layer Deposition System is capable of producing very high quality depositions of both Aluminum Oxide and Aluminum Nitride Films. By pulsing the precursor gases over the sample, the ALD system is able to deposit thin films one atomic layer at a time. The result is pinhole free films with very uniform thickness across the entire sample surface. Samples are heated to 250C for the deposition process. More details about the process can be found at http://cambridgenanotech.com/