Anvik Large-Area Lithography System (HEXSCAN 2020 SXE)
The Anvik HEXSCAN 2020 SXE is a large-area, high-resolution projection lithography system equipped with a KrF excimer laser at 248nm wavelength and 80W average power. It can be used for both photolithography and photoablation applications. Using a 1:1 projection system and a seamless scanning technique, exposures can be performed over large areas (up to 50x50cm) with layer-to-layer alignment accuracy of 0.25micron and resolution to 2microns. Currently 4, 5, and 6 inch masks can be used with the system.
For more information contact Glennys Mensing