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Micro and Nanotechnology Laboratory | U of I

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Micro and Nanotechnology Laboratory
208 North Wright Street Urbana, Illinois 61801


Office hours 8:30a - 5:00p


Phone: 217-333-3097
Fax: 217-244-6375


Anvik Large-Area Lithography System (HEXSCAN 2020 SXE)

System Description:

The Anvik HEXSCAN 2020 SXE is a large-area, high-resolution projection lithography system equipped with a KrF excimer laser at 248nm wavelength and 80W average power. It can be used for both photolithography and photoablation applications. Using a 1:1 projection system and a seamless scanning technique, exposures can be performed over large areas (up to 50x50cm) with layer-to-layer alignment accuracy of 0.25micron and resolution to 2microns. Currently 4, 5, and 6 inch masks can be used with the system.

For more information contact Glennys Mensing