AG Rapid Thermal Processor
The AG 610 rapid thermal processor for small piece to 6” wafer, which uses high-intensity, visible radiation to heat single wafer for short periods at precisely controlled temperatures. It has aluminum chamber with water cooling and gold plating for better uniformity, extended range pyrometer (ERP) for high temperature sensor and control, isolated quartz tube of clean environment for wafer, bottom and top heating with radiation heating lamp module, and precise temperature/time control, temperature measurement. It contacts with N2 and Ar. Temperature range is from 600°C to 1100°C. Ramp rate is from 10°C/s to 50°C/s.