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The following form is provided to users of the Micro and Nanotechnology Laboratory as a convenient means of submitting a job request for the E-Beam Lithography System. Complete the form and click on the Submit button at the bottom of the page. The form will be emailed to John Hughes.

First Name^*

M.I.

Last Name^*

Principal Investigator^*

Department/Organization^*

Work Phone

E-mail^*

Account Name^*

Account Number^*

PDP UIC
[200, ]

DEC AlphaStation Directory

Jobfile Name:

Group Name

List binary files used in jobfile:

Masks:
Size: 4 inch 5 inch	Type: Light field Dark field

Direct-Write:
Material	Sample Size

Field Size:
1.6384 mm
0.4096 mm
Other
mm

Estimate of Pattern Density:

Approximate overall area to be written:

Detail any unusual or critical aspects of this job. What is the smallest feature size (line or space)?

Please give a brief description of how this mask or sample will be used in your research.

^*required items

Micro and Nanotechnology Laboratory | U of I

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E-Beam Request Form

Cambridge E-Beam Lithography Job Request Form