facilities
Highlights
AET Addax Model RX Rapid Thermal Processor
Description:
The RTP uses high intensity, visible radiation to heat samples for short periods (1-600 seconds) at precisely controlled temperatures. The steady state temperature range is from 400-1150 C and the heating rate is variable from 1-200 C per second. Quartz vacuum-pumped chamber with the capability of having an annealing ambient of oxygen, argon, nitrogen, or forming gas (5% H2 in N2). Microprocessor control provides precise time-temperature profiles which can be tailored for a variety of processing applications including ion implant activation, annealing, oxide reflow, silicide formation, contact alloying, and gallium arsenide processing. Samples up to and including 4" wafers can be accommodated.